MANUFACTURE OF ZnO RODS AND USE OF ELECTRON BEAM LITHOGRAPHY FOR ASSEMBLY OF STRUCTURES TO MEASURE TRANSPORT EFFECTS.
Zinc oxide, nanostructures, lithography, transport effects.
Zinc oxide (ZnO) is a semiconductor with a wide range of applications in electronic and optoelectronic devices. This material can be processed into different morphologies using different fabrication methods, which allows the optimization of its properties for specific applications. In this study, we used different cleaning routes on silicon substrates to obtain ZnO rods in their hexagonal wurtzite form. These ZnO-based nanostructures can benefit from electron beam lithography (EBL), an advanced nanofabrication technique that allows the creation of nanometer-scale patterns with high precision, being crucial for the development of high-performance structures and components. Using this technique and ZnO, it is possible to have strict control of the dimensions of the structures, directly impacting the electronic and optical properties of the material. This material serves as a basis for studying transport effects such as conductivity and mobility of charge carriers, where they can be modified by characteristics such as quantum confinement, surface interactions and mobility variations, influencing the performance of devices such as transistors and sensors.